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Photonics Buyers' Guide

OPTICS & OPTICAL FABRICATION


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HASTILITE MOV 850
HASTILITE MOV 850
Universal Photonics Inc., United States
HASTILITE MOV 850 for Clean CNC Polishing HASTILITE MOV 850 is used for critical polishing applications on a variety of glass types, glass-ceramics, and some optical crystals. HASTILITE MOV 850 was created with rare earth and other oxides that have been finely processed to produce narrow sub-micron particle size range. HASTILITE MOV 850 contains technical enhancements for improved settling, and efficient polishing characteristics.
  • Type: Polishing Material and Pads
  • pH: 7.8 - 8.8
  • Solid Content (%): 40 - 50
  • Particle Size D50 (μm): 0.3 - 0.5
  • Particle Size D99 (μm): < 2
  • Density (g/mL): 1.4 - 1.6
  • Size Availability: 1 Gallon, 1 Pint

1X2(2X2) P-M Fiber Coupler
1X2(2X2) P-M Fiber Coupler
Yangtze Optical Electronic Co. Ltd. (YOEC), China
The 1x2 (2x2) polarization-maintaining fiber coupler fabricated by using special polarization-maintaining fiber and strong-fused tapering process can divide the polarized light into two beams with the same polarization state as the input light, and can support any splitting ratio as required.
  • Type: Other
  • Operation wavelength: 1310/1550 nm
  • Return loss: >50.0 dB
  • Operation temperature: ~40~+70 °C
  • Storage temperature: -55~+85 °C
  • Pigtail length: 1.0±0.2 m

3M TRIZACT Diamond Tile Abrasive Pad
3M TRIZACT Diamond Tile Abrasive Pad
Universal Photonics Inc., United States
3M's TRIZACT Diamond Tile removes material faster than coarse slurries or fixed pellets, with less subsurface damage and without the cleaning issues of free abrasive lapping. TRIZACT is a structured, fixed abrasive composite, consisting of inorganic abrasive (vitreous diamond agglomerates) in an organic binder (cross-linked polymer), capable of lapping a multitude of substrates.
  • Type: Abrasives
  • Available Grades (µ): 3, 6, 9
  • PSA Backing: Yes
  • Customization: Yes

X-59 Strip Coating
X-59 Strip Coating
Universal Photonics Inc., United States
X-59 Strip Coating is a multi-purpose protective coating for all types of optical surfaces, affording protection in both production and handling applications. Simply brush on X-59 Strip Coating in thin even strokes and remove by applying tape at the edge of coating and peel away. Any remaining residue can be dissolved with a solvent.
  • Type: Other
  • Color: Black
  • Tack Free Time (min): 15 - 30
  • Full Dry Time (hr): 24
  • Specific Gravity: 0.84 - 0.96
  • Viscosity (#2 ZAHN, sec): 30 - 40
  • Size Availability: 1gl

HASTILITE Nano Silicon Polish
HASTILITE Nano Silicon Polish
Universal Photonics Inc., United States
HASTILITE NANO-SiC 100 is an aqueous slurry of hexagonal SiC crystals. This abrasive maximizes cut rates, while minimizing subsurface damage. The chemical inertness to most acids and bases, in combination with its heat and abrasion resistance, makes HASTILITE NANO-SiC suitable for extreme polishing conditions. HASTILITE NANO-SiC can be used on silicon, sapphire, SiC wafers and ceramic-based substrates.
  • Type: Polishing Material and Pads
  • pH: 8 - 10
  • % Solids: 15 - 20
  • SiC Content (%): 50+
  • Particle Size D50 (μm): 0.110 - 0.140
  • Particle Size D99 (μm): < 0.389
  • Size Availability: 1pt, 1l, 1gl

S3 Super Smooth Surfactant
S3 Super Smooth Surfactant
Universal Photonics Inc., United States
S3 Super Smooth Surfactant is a high-performance additive engineered to reduce distortion in mid to high spatial frequency – a must-have for any super-polishing application. This low-foam, eco-friendly cleaner and surfactant reduces surface roughness, prevents swarf redeposition and enhances particle dispersion. S3 is water-soluble at any concentration and compatible with alkaline and acidic media.
  • Type: Additives
  • Appearance: Pale Blue Liquid
  • pH: 6.0 - 7.5
  • Size Availability: 1pt, 1gl, 5gl

SC-955 PAD
SC-955 PAD
Universal Photonics Inc., United States
SC-955 PAD for High-Pressure Applications SC-955 is the material of choice for applications where higher removal rates and consistent flatness are required. Key to SC-955’s superior performance is its tightly controlled pore structure. Small and consistent throughout the polyurethane architecture, the pores “meter” external polishing or finish slurries while supporting uniform points of contact between the pad and working surface.
  • Type: Polishing Material and Pads
  • Density (g/cm3): 0.30 - 0.42
  • Removal Rate (µm/min): 0.68
  • Size Availability: Custom
  • PSA Backing: Yes

EVERFLO Surfacing Additive
EVERFLO Surfacing Additive
Universal Photonics Inc., United States
EVERFLO is a concentrated liquid additive that accelerates the action of abrasive and polishing compounds. Its unique properties consistently deliver added processing benefits and results such as reduced rouge scratching, extended tool life and improved surface finish. EVERFLO works as a pad pre-conditioner enabling slurry to remain in contact with the work surface for optimal performance.
  • Type: Additives
  • pH: 6.4 - 8.6
  • Viscosity (cP): 1000 - 3100
  • Density (g/mL): 0.95 - 1.00
  • Freezing Point (°F): 26 - 28
  • Size Availability: 1pt, 1gl, 5gl, 55gl

CP PITCH for Continuous Polishing
CP PITCH for Continuous Polishing
Universal Photonics Inc., United States
The CP PITCH series is uniquely engineered for a broad variety of continuous polishing operations on glass, ceramics, infrared materials, crystals, metals and other exotic materials. Its refined natural formulation ensures batch-to-batch consistency and can polish materials that require a high degree of flatness control. Different grades of CP PITCH can be created for specialty applications.
  • Type: Polishing Pitch
  • CP55 Softening Point (°C): 52 - 55
  • CP64 Softening Point (°C): 68 - 72
  • CP73 Softening Point (°C): 77 - 80
  • CP82 Softening Point (°C): 79 - 82
  • CP91 Softening Point (°C): 84 - 87
  • Size Availability: 1kg, Bulk Tray

UNICER 1000 Cerium Polish
UNICER 1000 Cerium Polish
Universal Photonics Inc., United States
Premium-grade cerium oxide polish designed for a wide range of precision optics and ophthalmic applications where a high quality surface finish is required to meet the most critical and demanding specifications. UNICER 1000 performs across a wide range of speeds, pressures and pad materials. UNICER 1000 can be used for cleaning glass surface before coating or in coated or mirror glass production.
  • Type: Polishing Material and Pads
  • Appearance: Off White, Powder
  • Cerium Oxide Content (%): ≥ 58
  • Particle Size D50 (μm): 0.8 - 2.0
  • Particle Size D99 (μm): ≤ 13
  • Size Availability: 20 kg, 5kg, 1lb

HASTILITE Ceria-Base Polish
HASTILITE Ceria-Base Polish
Universal Photonics Inc., United States
HASTILITE PO and HASTILITE PO ULTRA meet stringent optics specifications with 90% APS < 1.0 µm. High ceria-base yields sleek-free finishes on softer glass, while producing extremely low scatter on harder glass and ceramic materials. PO and PO ULTRA’s versatility addresses high speed polishing needs in a wide variety of polishing systems, including super-polishing, pitch polishing or LP pad polishing.
  • Type: Polishing Material and Pads
  • pH: 6 - 7
  • Particle Count D50 (μm): 0.4 - 0.7
  • PO Density (g/mL): 1.50 - 1.68
  • PO ULTRA Density (g/mL): 1.50 - 1.57
  • PO Solid Content: 40 - 50
  • PO ULTRA Solid Content: 40 - 44




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